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This Practice covers the analysis of the crystallographic perfection in silicon ingots
SEMI G64-96 (first published)
SEMI MF723-0307 (technical revision)
SEMI M1-0924 (technical revision)
1 Ωcm for n-type silicon with minor changes in the measurement procedure
M06600 - SEMI M66 - MISフラットバンド電圧―絶縁膜厚法を使った，酸化膜，およびhigh-κゲートスタックの有効仕事関数の算出方法 StdPbc-1113 This Practice covers the analysisglobal Silicon Wafer Committee2006516global Audits and Reviews Subcommittee20066www. semi. org20067CD ROM E 20072 R2 2. 3 CMOSInternational Technology Roadmap for Semiconductors1nmSiO2 CMOSn+ p+ SiO2SiO2high Referenced SEMI Standards SEMI M59 Terminology for Silicon Technology SEMI MF1153 Test Method for Characterization of Metal Oxide Silicon (MOS) Structures by Capacitance Voltage Measurements