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T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdPbc-0924 SEMI D20-1000 (technical revision)

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Description

SEMI D20-1000 (technical revision)

Flat Panel Display Equipment Committeeで技術的に承認されたもので,North American Flat Panel Display Committeeが直接責任を負うものである。現版は,1998年8月15日にNorth American Regional Standards Committeeに承認されている。1998年9月にまずwww

orgで入手可能となる。初版は1999年発行。前版は2005年3月発行。

SEMI PV57 — Test Method for Current-Voltage (I-V) Performance Measurement of Organic Photovoltaic (OPV) and Dye-Sensitized Solar Cell (DSSC) and Perovskite Solar Cell(PSC)

Although nanotopography measurements have not been needed for 0

T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdPbc-0924 SEMI D20-1000 (technical revision)This Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38. This Specification

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